ITO film production methods TFT Display Module

1, vacuum magnetron sputtering 8x2 lcd display
During the sputtering process, in the case of the high oxygen flow rate, from the target to bombard the metal In, Sn atoms in the vacuum chamber or the substrate surface and oxygen react sufficiently In2O3 and SnO2
2, screen printing or ink-jet printing method
Currently only silkscreen method Sumitomo practical technology for use on the company's own products, is said to be better quality than the traditional way. ITO microcrystalline powder formulations generally use a more reasonable way to produce screen printing, nano-ITO powder formulations can be used to find an inkjet printing method.
This approach undoubtedly the highest production efficiency, in most cases, eliminating the need for subsequent etching process, directly produce the desired pattern ITO transparent electrode, is the future direction of the main research and development.
3, the semiconductor process Lift-off approach
The PET film substrate may alternatively be printed on the first negative type pattern, followed by ITO coating, and finally the removal of printing ink. display lcd 16x2