Chemical etching method for preparing ITO pattern Character LCD Modules

Currently the most widely used industry ITO film, mostly using the magnetron sputtering method produced. Magnetron sputtering ITO layer generated, can be understood as a number of individual atoms or groups of atoms are oxidised to form a thin film stacked together, so a macro sense, it can be understood as having isotropic properties, that is, optical, electrical, chemical and other properties, and is basically the same in all directions. This feature allows the ITO film during chemical etching, the chemical reaction in each direction are the same, to obtain a good pattern reproducibility. The edges of the graph because even three to five times over etching time, and only in a few hundred to several thousand angstroms edge loss of lateral erosion area above the line for the micron, the angstrom tolerances can be completely ignored. 122x32 lcd
ITO layer is understood as the isotropic characteristic macroscopic point several occasions stressed that ITO is a non-crystalline structure such as keys embodied anisotropy is completely different concept, emphasizing its crystal structure, is to emphasize the microstructure representation on the stability of this stability can be specifically describe some of its physical and chemical parameters are relatively constant value, but from a macro perspective, ITO can not really become a complete structure of the crystal structure. 192x64 lcd