TFT Display Module design elements

TFT is the production of large-area deposition technique (sputtering, CVD) and the product of the combination lithography. Currently, the fifth generation production line is generally only four sub-lithographic TFT is formed that can require the insulating film, a semiconductor film, a pixel electrode (ITO) and so on. Primarily on the design of the Coding System lcd module product specifications indicators, one of screen size, number of pixels, drive mode, the opening ratio is particularly important for the design of the TFT. To consider the basic structure of the TFT, the film material, pitch / width, arrangement of electrodes and other basic elements lithography registration. In order to improve the response speed and reduce the wiring resistance, at present, when the scanning line driving from one side of 15-inch XGA basic use of molybdenum and tungsten alloy 20-inch SXGA aluminum, larger than 20 inches higher resolution when using copper material. However, if the drive is designed to scan both sides of the line, you can relax on the wiring resistance requirements.

Built-screen first need the CF and TFT glass substrate coated on a glass substrate were oriented film after curing with a rubbing cloth directional processing, and then on the CF substrate crossed with dispensing closure box and pre-produced liquid crystal droplets, and then Graphic lcd modules substrate superposed on the bit nip formed on the CF substrate gap thickness of 5 microns of the liquid crystal cell. Finally, the UV-curing glue sealed box, cut / paste side lobes and two polarizers.