Low-temperature polysilicon Character LCD Modules rising star

As early as 1999, the low-temperature polysilicon Tsingtek low temperature lcd display has been around , so it is far from what the new technology . However, due to various reasons, the slow development of low-temperature polysilicon technology , and even stay long in words, until the recent breakthrough in the field appears to be outside again before starting to pay attention . Low-temperature polysilicon stands for "Low Temperature Poly-Silicon (LTPS, polysilicon is also known as the p-Si, the same below ) ," which is a branch of polysilicon technology. On the lcd graphic display modules monitor , the adoption of polysilicon liquid crystal material has many advantages , such as thin-film circuits can be made thinner and smaller , lower power consumption and so on , we will focus on the following . However, in the early development of polysilicon technology , in order to transition from the amorphous glass substrate structure (a-Si) is a polycrystalline structure, it must use a laser annealing (Laser Anneal) high-temperature oxidation step , when the temperature exceeds the glass substrate graphic lcd display module . Known, ordinary glass softens at this high temperature melting , can not work properly , and only the silica glass to be able to withstand such high temperature processing . The quartz glass is not only expensive and sizes are smaller , not as a display panel makers naturally chose the cheap amorphous material (a-Si), which is the situation we see today. However, the industry has not given up efforts to develop low-temperature polysilicon technology become the consensus , after years of effort, low-temperature polysilicon finally step into reality. Compared with the conventional high temperature polysilicon , low temperature polysilicon although laser irradiation step needs , but it is used as a heat source is an excimer laser , the laser transmission through the system will produce a uniform distribution of the laser beam energy in the amorphous structure and projected on a glass substrate when the glass substrate is an amorphous silicon structure of the energy absorption of the excimer laser , the structure will be transformed into polycrystalline silicon . Since the entire process is completed in less 500-600 ° C , conventional glass substrate can withstand , which greatly reduces the manufacturing cost , the polysilicon LCD technology into the display area also feasible .